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A Novel Dedicated HVE 14C AMS System

Published online by Cambridge University Press:  24 July 2019

M Klein*
Affiliation:
High Voltage Engineering Europa B.V., Amersfoort, The Netherlands
N C Podaru
Affiliation:
High Voltage Engineering Europa B.V., Amersfoort, The Netherlands
D J W Mous
Affiliation:
High Voltage Engineering Europa B.V., Amersfoort, The Netherlands
*
*Corresponding author. Email: info@highvolteng.com.
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Abstract

High Voltage Engineering Europa (HVE) has designed a vacuum-insulated tandem accelerator dedicated to radiocarbon (14C) analysis. A unique feature of the design is a magnetic charge state selector that is incorporated in the high voltage terminal, which reduces the primary source of background that originates from the injection of 13CH− to negligible levels. As a result, background levels in the low 10−16 regimes are anticipated, thus supporting the most stringent 14C dating applications. Another feature of the system is the incorporation of several slit feedback loops for stabilization of the position of the ion beam throughout the system, which avoids drift and ensures stable, long-term operation. Finally, this article presents measurements and quantitative analysis of background contributions from 13CH−.

Information

Type
Conference Paper
Copyright
© 2019 by the Arizona Board of Regents on behalf of the University of Arizona 
Figure 0

Figure 1 Layout of the 4102Bo-AMS system, showing: A) sample chamber with sample carousel; B) ion source chamber; C) einzel lens; D) bouncer magnet with high voltage enclosure; E) Y-steerer with ion beam blanking capability; F) 12C offset Faraday cup; G) accelerator vessel; H) high-voltage terminal; I) stripper canal; J) magnetic charge state selector; K) high-energy analyzing magnet; L) Y-steerer; M) 12C and 13C offset Faraday cups; N) electrostatic analyzer; and O) 14C gas ionization detector.

Figure 1

Figure 2 The layout of the 300 kV vacuum-insulated multi-isotope system.

Figure 2

Figure 3 Types I, II, and III backgrounds with their magnetic and electrostatic rigidities.

Figure 3

Table 1 This table summarizes the three major contributions to the background of the system, resulting from 13CH− injection. Data shown are relative to 14Cref. The background is calculated from the various contributions to the total suppression (“Total”), assuming 13CH/12C = 10−4 and assuming a 14C+ yield of 45% in the stripping process: Background = Total ×10−4 / 45%.

Figure 4

Figure 4 ESA suppression for constant ME/q2 ion beams. Suppression levels of background types I and III are indicated.

Figure 5

Figure 5 High-energy analyzing magnet suppression for constant E/q ion beams. Suppression levels of background type II and III are indicated.