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Coherent light trapping in thin-film photovoltaics

Published online by Cambridge University Press:  10 June 2011

Shrestha Basu Mallick
Affiliation:
Stanford University; sbasumal@stanford.edu
Nicholas P. Sergeant
Affiliation:
Stanford University; Nicholas.p.sergeant@gmail.com
Mukul Agrawal
Affiliation:
Applied Materials, Santa Clara, CA; mukul_agrawal@amat.com
Jung-Yong Lee
Affiliation:
Korea Advanced Institute of Science and Technology; jungyong.lee@kaist.ac.kr
Peter Peumans
Affiliation:
Stanford University; ppeumans@stanford.edu

Abstract

Thin-film photovoltaic technologies have an enormous potential to reduce the cost of solar electricity. However, because thin photoactive layers are used, optical absorption is incomplete unless light-trapping strategies are employed. Since conventional light-trapping approaches based on geometric scattering are less effective in thin-film cells, coherent light-trapping approaches that exploit the wave nature of light are being explored to enhance optical absorption. In this article, we look at the various strategies for coherent light trapping in thin-film solar cells, including photonic crystals, metal nanostructures, and multilayer stacks. The suitability of a particular strategy depends on factors such as configuration of the solar cell, process compatibility, cost, desired angular response, and materials usage. We also discuss the physical limits of light trapping in thin films.

Information

Type
Research Article
Copyright
Copyright © Materials Research Society 2011
Figure 0

Figure 1. (a) The ability of an anti-reflection coating (ARC) to maximize optical absorption is limited because the optical path length is not altered. (b) Incoherent or geometric light trapping where random scattering off of a Lambertian surface is used to increase the optical path length inside the photoactive region. (c) Coherent light-trapping where interference, diffraction, and optical electric field concentration are exploited to enhance the likelihood that an incident photon is absorbed in the photoactive region.

Figure 1

Figure 2. (a) Planar slab with ideal anti-reflection coatings (ARCs). (b) Absorber with an ideal back reflector and Lambertian front surface with ideal ARC. The enhancement of the average optical path length is 4n2. (c) Concentrator with backside reflector placed in front of the cell of (b). This leads to an increased optical path length at the cost of a reduced acceptance angle. (d) Optical absorption enhancement as a function of angle of incidence for cases (a), (b), and (c). Note that this graph was drawn to represent trends and is not based on actual data.

Figure 2

Figure 3. (a) Coherent light-trapping approach that is bound by the Yablonovitch limit because it relies on scattering into non-evanescent modes. (b) Light-trapping strategy that can surpass the Yablonovitch limit on account of deep-subwavelength-scale confinement and field-enhancement characteristic of evanescent optical modes (adapted from Reference 15).

Figure 3

Figure 4. Three photonic crystal-based light-trapping strategies. (a) A photonic crystal is used as an omnidirectional reflector to reflect light back into the photoactive region without losses. (b) The photonic crystal is used as a diffractive element/scattering element that resides outside the photoactive region but scatters incident light into quasi-guided modes supported by the unpatterned photoactive region that can be thin or thick. (c) The photoactive region itself is patterned into a photonic crystal to couple incident light into quasi-guided modes.

Figure 4

Figure 5. (a) Schematic of the double-layered photonic crystal in a 400 nm-thick Si slab. (b) Optical absorbance at normal incidence of the photonic crystal structure (gray) as compared to a planar slab of equivalent volume (purple). The Yablonovitch limit is shown for reference (red). The photonic crystal structure beats the Yablonovitch limit in certain spectral regions. (c) Hemispherically averaged absorption for s polarization (when the electric vector is perpendicular to the plane of incidence) and p polarization (when the electric vector is parallel to the plane of incidence) for both patterned (gray) and reference (purple) structures. When integrated over all angles of incidence, the enhancement does not exceed the Yablonovitch limit. (d) Optical electric field intensity profile in an x-z cross-section in the structure at a wavelength of 826 nm.

Figure 5

Figure 6. Three light-trapping approaches that use metal nanostructures. (a) Scattering elements couple incident light into quasi-guided modes, which have a higher lifetime in the absorbing material, thus increasing the possibility of absorption. (b) Excitation of surface plasmon polariton (SPP) modes at the metal-dielectric interface. In addition to exciting a quasi-guided mode, this approach also results in optical electric field concentration. Field concentration results in increased absorption, as absorption is proportional to the square of the electric field concentration. (c) Optical electric field concentration due to the excitation of localized surface plasmon resonance results in locally increased absorption.

Figure 6

Figure 7. (a) Schematic of a metal nanoparticle embedded in an absorber. Ei and Hi refer to the incident electric and magnetic fields, respectively. Es and Hs refer to the scattered electric and magnetic fields, respectively. (b) Ratio of the intensity of the scattered to incident optical electric field as a function of polar angle, θ, when the azimuthal angle φ is 0° (i.e., at the equator, solid blue line) and 90° (dashed red line), respectively, for a 10 nm-diameter Ag metal nanoparticle at plasmon resonance conditions (λ = 460 nm). (c) Logarithm (10 base) of the enhancement of absorbed optical power averaged over a 0.1 nm-thick shell concentric with the metal nanoparticle as a function of shell radius. The shell radius for which the absorption is enhanced by 10% is indicated by a white dashed line. The color bar shows the enhancement in absorption. (d) Logarithm (10 base) of the enhancement in optical absorption efficiency in the region bound by r = 5 nm and r = 10 nm for a 10 nm-diameter Ag metal nanoparticle embedded in a medium as a function of the imaginary part of the refractive index (the real part is set to 1.8).