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Structure formation and evolution in semiconductor films for perovskite and organic photovoltaics

Published online by Cambridge University Press:  21 March 2017

Andrew J. Pearson*
Affiliation:
Cavendish Laboratory, University of Cambridge, Cambridge CB3 0HE, U.K.
*
a) Address all correspondence to this author. e-mail: ap824@cam.ac.uk

Abstract

The research and development of novel photovoltaic technologies is going through a golden era, thanks to the demonstration of remarkable efficiencies across a broad range of semiconductor classes and device architectures. In parallel with these developments, the opportunities for characterizing the structure of a semiconductor film in situ of a processing step have also increased, to the extent that in situ and in operando experiments are becoming readily accessible to researchers. These combined advances represent the subject matter of this article, wherein studies that improve our understanding of structure formation and evolution in perovskite and organic semiconductor films for innovative solar cells are reviewed. Although focus is placed on the dynamics of semiconductor film formation, the review also highlights recent research on environmental testing, a key component in the development of materials with high intrinsic stability.

Information

Type
Invited Review
Copyright
Copyright © Materials Research Society 2017 
Figure 0

FIG. 1. Overview of the primary sample characterization methods discussed in this work. (a) XRD, (b) X-ray scattering, (c) grazing-incidence X-ray scattering.

Figure 1

FIG. 2. (a) Schematic crystal structure of an ABX3 perovskite, where the A cation surrounds X anions in corner-sharing BX octohedra. Parts (b) and (c) show XRD and scanning electron microscopy data for CH3NH3Pb(IxCl1−x)3, respectively, highlighting the differences in film uniformity between vapor- and solution-processing routes. Reprinted with permission from Ref. 37. Copyright 2013 Nature Publishing Group.

Figure 2

FIG. 3. Schematic setup [part (a)] and in situ XRD data [part (b)] for CH3NH3Pb(IxCl1−x)3 (MAPb(I,Cl)3) perovskite during a temperature ramp of the PbCl2 source. At relatively high PbCl2 fluxes, a chlorine-rich perovskite phase (Phase B) preferentially forms over an iodine-rich perovskite (Phase A). Reprinted with permission from Ref. 38. Copyright 2014 American Chemical Society.

Figure 3

FIG. 4. Comparison of one-step [part (a)] and two-step [part (b)] methods for the preparation of a perovskite thin film.

Figure 4

FIG. 5. Overview of “one-step” formation of CH3NH3Pb(IxCl1−x)3 perovskite, as inferred from in situ GIWAXS measurements. (a) Azimuthally integrated GIWAXS patterns corresponding to the precursor, intermediate, and perovskite phases during an isothermal annealing step at 90 °C. Parts (b) and (c) detail the growth kinetics of the perovskite phase—determined from the intensity of the [110] perovskite reflection at q ∼1 Å−1—for isothermal annealing temperatures between 80 and 110 °C. Reprinted with permission from Ref. 54. Copyright 2015 American Chemical Society. Insight into the evolution of crystal grain orientation is provided in parts (d)–(f), where the presented 2D GIWAXS patterns correspond to the precursor phase (d), an intermediate phase containing 50% CH3NH3Pb(IxCl1−x)3 (e), and the fully formed CH3NH3Pb(IxCl1−x)3 phase (f) during a 80 °C isothermal anneal. Reprinted from Ref. 53 under a Creative Commons BY 4.0 license. In situ GIWAXS patterns for a drop-cast sample annealed at 70 °C are shown in part (g) with the corresponding kinetics shown in (h). Reprinted with permission from Ref. 58. Copyright 2016 American Chemical Society.

Figure 5

FIG. 6. In situ GISAXS data (Guinier plots) showing the evolution in one-step processed CH3NH3Pb(IxCl1−x)3 perovskite during a 80 °C isothermal anneal. Reprinted from Ref. 53 under a Creative Commons BY 4.0 license.

Figure 6

FIG. 7. Schematic representation of the main processes that take place during CH3NH3Pb(IxCl1−x)3 perovskite formation and degradation. The approximate relative intensity of X-ray scatter from each phase (proportional to its abundance in the sample) is represented by the intensity of the color bars.57 Reproduced by permission of The Royal Society of Chemistry.

Figure 7

FIG. 8. Time-resolved XRD measurements of CH3NH3PbI3 perovskite thin films during postformation hydration under conditions of 90% relative humidity/25 °C. Perovskite films were initially prepared using stoichiometric mixtures of CH3NH3I and PbI2 or 5% molar excess of either. Green, purple, and yellow symbols correspond to CH3NH3PbI3, PbI2, and CH3NH3PbI3·H2O phases respectively, and clarify the different onsets of perovskite degradation. Figure reprinted with permission from Ref. 73. Copyright 2016 Wiley-VCH.

Figure 8

FIG. 9. (a)–(c) In situ temperature-dependant XRD scans of drop-cast perovskite precursor solutions prepared using 1:1 mol% CH3NH3I (MAI):PbI2, mol% 1:1:1 CH3NH3I:CH3NH3Cl (MACl):PbI2, or 3:1 mol% CH3NH3I:PbCl2. In parts (d)–(f), the same precursor samples are subject to in situ temperature-programmed desorption mass spectrometry (TPD-MS) measurements that provide insight into the loss of organic material during heating.57 Reproduced by permission of The Royal Society of Chemistry.

Figure 9

FIG. 10. Overview of solvent engineering methods that promote the formation of perovskite films with improved optoelectronic properties. Part (a) outlines the main steps in “one-step” processing of CH3NH3Pb(I1−xBrx)3 perovskite films, with an additional step (the toluene drip) applied within the final 30 s of the precursor spin coating step. Reprinted with permission from Ref. 75. Copyright 2014 Nature Publishing Group. In part (b), a series of scanning electron micrographs are presented for CH3NH3PbI3−xClx films prepared using various alkyl-chain additives in the precursor solution, where the top row of images correspond to a field-of-view of approximately 5 × 4 µm2.78 Reproduced by permission of The Royal Society of Chemistry. Parts (c) and (d) correspond to films of CH3NH3PbI3 prepared using an acetonitrile/methylamine solution.76 Reproduced by permission of The Royal Society of Chemistry.

Figure 10

FIG. 11. In situ GIWAXS characterization of CH3NH3PbI3 perovskite during two-step processing. (a) GIWAXS pattern for a vacuum-deposited PbI2 thin film before CH3NH3I drop-casting. Parts (b) and (c) correspond to the same sample shortly after drop-casting and at a later time where diffraction features relating to the perovskite can be identified. Reprinted with permission from Ref. 84. Copyright 2015 American Chemical Society.

Figure 11

FIG. 12. In situ XRD scans of vapor-phase grown CH3NH3Pb(I1−xBrx)3 films. Here, the temperature of the environment is 120 °C and the composition of the initial lead halide film is PbBr1.2I0.8. The data show that with increasing reaction time, the formation of CH3NH3PbI3 is favored. Reprinted with permission from Ref. 85. Copyright 2016 American Chemical Society.

Figure 12

FIG. 13. In situ XRD patterns of FAPbI3 formation and degradation, with peaks labeled according to each crystalline phase.88 Reproduced by permission of The Royal Society of Chemistry.

Figure 13

FIG. 14. In situ XRD patterns for a CH3NH3PbI3 film exposed to humid air (80% relative humidity) (a) and a subsequent drying step (35% relative humidity) (b). Reprinted with permission from Ref. 51. Copyright 2015 American Chemical Society.

Figure 14

FIG. 15. Evolution in P3HT:PCBM film morphology during solution casting. Part (a) depicts the evolution in film solid concentration as a function of drying time, as determined from in situ optical reflectivity measurements. The growth kinetics of P3HT crystallization—inferred from the integrated intensity of the (100) X-ray reflection that corresponds to polymer lamella ordering—are shown in (b). Out-of-plane GIWAXS patterns at key points in the drying process are shown in part (c). These datasets are used to construct a model for film formation, which is illustrated schematically in part (d). Reprinted with permission from Ref. 107. Copyright 2015 American Chemical Society.

Figure 15

FIG. 16. Evolution in film morphology for blends of DPPBT:PC71BM cast from chloroform/dichlorobenzene solvent mixtures, as characterized by in situ GIWAXS (a) and GISAXS (b). Here the GIWAXS measurements are used to characterize the crystallization of the polymer and the loss of solvent residue forms the film, and the GISAXS measurements are used to probe the characteristic domain size of phase separated aggregates. Detailed kinetic analyses on both datasets are presented in parts (c) and (d), respectively. Figure reprinted with permission from Ref. 110. Copyright 2015 Wiley-VCH.

Figure 16

FIG. 17. Phase diagram highlighting the conditions for polymer aggregation in DPP:fullerene blends prepared with varying concentrations of co-solvent in the casting solution. Accompanying figures illustrate schematically the key steps in structure formation with or without co-solvent processing. Reprinted with permission from Ref. 111. Copyright 2015 Nature Publishing Group.

Figure 17

FIG. 18. Overview of film formation mechanisms and kinetics for P3HT/PCBM blends cast from (a) CB, (b) CB with CN additive, and (c) CB with ODT. Figure reprinted with permission from Ref. 116. Copyright 2015 Wiley-VCH.

Figure 18

FIG. 19. In situ grazing-incidence X-ray scattering measurements of P3HT:PCBM during spin coating. Part (a) illustrates the principle components of the experimental setup. In part (b), the evolution in polymer ordering (inferred from the GIWAXS signal intensity), fullerene aggregation (inferred from the GISAXS signal intensity), and the thickness of the drying film are compared. Part (c) compares the time for morphology formation with the onset time for material crystallization, as a function of P3HT:PCBM blend composition. Figure reprinted with permission from Ref. 119. Copyright 2013 Wiley-VCH.

Figure 19

FIG. 20. (a) Comparison of film drying dynamics for PffBT4T-2OD:PC71BM blends prepared using CB/DIO solvent mixtures. Here, sample absorbance at 700 nm is used as a measure of PffBT4T-2OD aggregation. The data show that during blade coating the polymer undergoes aggregation at a higher film solid concentration (smaller thickness) than for spin-coated samples. Part (b) compares the differences in polymer lamella ordering and crystallite orientation during blade coating at 90 °C or 55 °C, where the lower temperature corresponds to a regime where polymer pre-aggregation in solution is favored. Note that the in situ GIWAXS figures are presented using a pole figure notation that clearly highlights variations in crystal orientation. Here an angle of 0° corresponds to the out-of-plane direction.123 Reproduced by permission of The Royal Society of Chemistry.

Figure 20

FIG. 21. In situ structural characterization data for thin film small molecule blends of BTR:PC71BM during annealing. The presented data show the evolution in GISAXS integrated scattering intensity (ISI)—sensitive to domain purity—and GIXRD integrated pole figure intensity—a probe of domain crystallinity—during thermal annealing (a), combined thermal/solvent annealing (CF for the first 15 s) (b) and combined thermal/solvent annealing (THF for the first 30 s) (c). Red lines correspond to fits of the GISAXS data using a two phase model consisting of pure BTR and a three-component mixed-amorphous phase of BTR, PC71BM, and solvent vapor.128 Reproduced by permission of The Royal Society of Chemistry.

Figure 21

FIG. 22. Comparison of measured (red line) and modeled (black squares) photocurrent values for a P3HT:PCBM OPV during burn-in. Parts (a)–(c) schematically illustrate the P3HT:PCBM blend nanostructure at different times, as determined through in situ µ-GISAXS measurements. In these figures, the red and green regions correspond to pure and mixed semiconductor phases of the dominant light absorber, respectively, where photons absorbed in these regions may be converted into free charge carriers (d). Figure reprinted with permission from Ref. 130. Copyright 2013 Wiley-VCH.