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Formation of microcones accompanied with ripple patterns in laser-activated plasma CVD of sp 3-bonded BN films

Published online by Cambridge University Press:  04 February 2014

Shojiro Komatsu*
Affiliation:
Plasma Application Group, National Institute for Materials Science, Tsukuba, Ibaraki 305-0044, Japan
Masaharu Shiratani
Affiliation:
Kyushu University, Motooka, Fukuoka 819-0395, Japan
*
a) Address all correspondence to this author. e-mail: Komatsu.Shojiro@nims.go.jp

Abstract

Scanning electron microscopic (SEM) observations revealed that individual and independent microcones of sp 3-bonded boron nitride grown by laser-activated plasma chemical vapor deposition were accompanied by ripple patterns spreading around them in the dimension of micrometers or sub-micrometers. The ripples were expanding equidistantly from each other and diminishing as they depart from a cone. The origin of the ripples was attributed to the interference of a direct laser cast on the plane surface and that reflected from the side of a cone; this model was satisfactorily in agreement with the SEM measurement, in which the side surface of a cone was mapped onto the plane surface surrounding the cone in the mathematical meaning of “bijection.” This micro-optical effect due to the wave nature of laser was considered to indicate and support the photochemically activated growth reactions in this process.

Information

Type
Articles
Copyright
Copyright © Materials Research Society 2014 
Figure 0

TABLE I. Experimental conditions for the preparation of the samples A, B, and C.

Figure 1

FIG. 1. SEM images showing the surface morphology of a BN film (sample A) prepared by laser-activated plasma CVD. The duration for the deposition of sample A was 15 min.

Figure 2

FIG. 2. (a) A photo of sample A taken with an optical microscope. The circle indicates the area where the microcones were found to have grown. The whole shape and the details are corresponding to the inhomogeneous distribution of the laser-intensity section. (b) A 2D-XRD mapping of sample A corresponding to the image (a). The circle is indicative of the area where the microcones were favorably grown. The mapped image shows the film-thickness topography depicted by relatively scanning a collimated thin beam (0.1 mm in diameter) of x-ray over the sample surface. The peripheral plane area painted green is higher in the altitude than the valley of the yellow in color gradation.

Figure 3

FIG. 6. SEM image of sample B, which was deposited for 30 min. The dotted circle indicates the area whose enlargement is shown in Fig. 7.

Figure 4

FIG. 7. The SEM image of microcones whose position in Fig. 6 is indicated there.

Figure 5

FIG. 8. The SEM image of sample C, which was deposited for 60 min.

Figure 6

FIG. 3. (a) SEM image of sample A. Each of the cones is accompanied by ripple patterns spreading around them. (b) EDX image mapping the x-ray intensity of nitrogen Kα. (c) EDX mapping image of boron Kα. (d) EDX image of silicon Kα. The EDX images (b), (c), and (d) are corresponding to the SEM image (a).

Figure 7

FIG. 4. SEM image of a microcone found on sample A. The triangle on the right shows the real proportion of the cone corrected for the tilt (30°) on the SEM observation. The arrows indicate the extent the reflected laser could reach if the cone had possessed an ideal shape.

Figure 8

FIG. 5. A simple beam interference model to explain the origin of the ripple pattern spreading around each of the cones.