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Application of high speed frame camera on the intense electron beam accelerator: An overview

Published online by Cambridge University Press:  04 September 2013

Xin-Bing Cheng
Affiliation:
College of Optoelectronic Science and Engineering, National University of Defense Technology, Changsha, Hunan, Peoples Republic of China
Jin-Liang Liu*
Affiliation:
College of Optoelectronic Science and Engineering, National University of Defense Technology, Changsha, Hunan, Peoples Republic of China
Bao-Liang Qian
Affiliation:
College of Optoelectronic Science and Engineering, National University of Defense Technology, Changsha, Hunan, Peoples Republic of China
*
Address correspondence and reprint requests to: Jin-Liang Liu, College of Optoelectronic Science and Engineering, National University of Defense Technology, Changsha, Hunan, Peoples Republic of China410073. E-mail: ljle333@yahoo.com

Abstract

High speed framing camera (HSFC) could be used to capture the image of the electron beams generated by the intense electron-beam accelerator (IEBA), and it is useful to visualize the evolution of discharging and plasma generation phenomenon. So an overview of the application of HSFC on the IEBA is presented. First, we introduce the synchronization problem of HSFC and IEBA, and a synchronization trigger system which could provide a trigger signal with rise time of 17 ns and amplitude of about 5 V is presented. Second, an imaging system based on IEBA, HSFC, and the synchronization trigger system is developed, and it can be used to image the developmental process of plasma in the output vacuum chamber of IEBA and to measure the electrical parameter of IEBA and electrical trigger signal in real time. Furthermore, the imaging system is used to investigate the developmental process of the electron beam of the A-K gap in vacuum under 180 nanosecond quasi-square pulses. It is obtained that the short A-K gap is closed prematurely under long pulse operation with plasma expansion velocity of about 6.25 cm/µs and the light emission in the A-K gap region has the characteristics of “re-ignition” with light duration time about 3800 ns. At last, the discharging process of surface flashover channel of poly-methyl methacrylate (PMMA) insulator with gap spacing of 170 mm in vacuum under nanosecond quasi-square pulses is studied by the imaging system, and the change of luminosity is analyzed during the surface flashover process.

Information

Type
Research Article
Copyright
Copyright © Cambridge University Press 2013 
Figure 0

Fig. 1. (Color online) Schematic diagram of the HSFC system.

Figure 1

Fig. 2. (Color online) Structure of the IEBA.

Figure 2

Fig. 3. (Color online) Time series of the operation progress of the electrical trigger module.

Figure 3

Fig. 4. (Color online) The operation principle of electrical trigger module of HSFC.

Figure 4

Fig. 5. (Color online) Typical waveform of load voltage and electrical trigger signal of HSFC.

Figure 5

Fig. 6. (Color online) Schematic diagram of the experiment setup.

Figure 6

Fig. 7. (Color online) Typical waveforms of trigger signal of HSFC (UT), experimental measured voltage waveform (UD), diode current (ID), and the time series of HSFC to image the optical emission from the vacuum diode.

Figure 7

Fig. 8. (Color online) Waveforms of experimental measured voltage and theoretical calculated voltage when the gap closure occurs.

Figure 8

Fig. 9. (Color online) Experimental perveance for the electron flow in the 5 mm A-K gap region of the diode

Figure 9

Fig. 10. (Color online) HSFC images of light emission from the 5 mm A-K gap region.

Figure 10

Fig. 11. (Color online) Schematic diagram of the vacuum chamber during the investigation of the surface flashover.

Figure 11

Fig. 12. (Color online) Typical waveforms of trigger signal of HSFC (UT), experimental voltage (UD) measured by resistive divider, surface flashover current (IS) measured by Rogowski coil, and the time series of HSFC to image the optical emission from the surface flashover event.

Figure 12

Fig. 13. (Color online) HSFC images of growing process of surface flashover of PMMA insulator.