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Low-power radio-frequency excitation as a plasma source in a Penning–Malmberg trap: a systematic study

Published online by Cambridge University Press:  13 July 2015

G. Maero*
Affiliation:
Dipartimento di Fisica, Università degli Studi di Milano, Via Celoria 16, 20133 Milano, Italy INFN Sezione di Milano, Via Celoria 16, 20133 Milano, Italy
S. Chen
Affiliation:
INFN Sezione di Milano, Via Celoria 16, 20133 Milano, Italy Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang, Sichuan 621900, China
R. Pozzoli
Affiliation:
Dipartimento di Fisica, Università degli Studi di Milano, Via Celoria 16, 20133 Milano, Italy INFN Sezione di Milano, Via Celoria 16, 20133 Milano, Italy
M. Romé
Affiliation:
Dipartimento di Fisica, Università degli Studi di Milano, Via Celoria 16, 20133 Milano, Italy INFN Sezione di Milano, Via Celoria 16, 20133 Milano, Italy
*
†Email address for correspondence: giancarlo.maero@unimi.it
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Abstract

A novel method was experimentally demonstrated to produce a low-density electron plasma in a Penning–Malmberg trap, exploiting the static electric and magnetic confinement fields together with a periodic excitation with amplitudes as low as 0.5–5 V and frequencies in the MHz range. This unusual technique proved to be applicable as a replacement for conventional electron sources in Penning devices and presents interesting aspects both in terms of basic science and technological applications. Nevertheless, the experimental observations demonstrate the high sensitivity of plasma features of interest (charge, mean density and density distribution) to the experimental conditions, namely trap configuration and excitation parameters, and as a consequence clear trends have not been identified so far. We present an experimental campaign of measurements where several parameters were systematically changed leading to a better assessment of the plasma production mechanism and to the identification of common trends.

Information

Type
Research Article
Copyright
© Cambridge University Press 2015 
Figure 0

Figure 1. Sketch of the trap electrode arrangement. Outer electrodes GND and SH are permanently grounded. Any pair of two electrodes can be set to a confinement potential $V_{C}$ to be used as endcaps while another one is employed as excitation antenna with an oscillating voltage signal $V_{RF}$. Diagnostic tools are also sketched: a charge collector connected to a high-impedance digital oscilloscope and a phosphor screen set to a potential $V_{ph}=5{-}15~\text{kV}$, whose image is recorded by a CCD camera.

Figure 1

Figure 2. Example of frequency sweep measurement. Trap length $L_{trap}=570~\text{mm}$, magnetic field $B=0.1~\text{T}$, excitation amplitude $V_{RF}=1.5~\text{V}$. (a) Total confined electron charge. The vertical dashed line indicates the threshold frequency ${\it\nu}_{thr}$ for plasma production and confinement. (b) Mean particle density. The transverse distributions of plasma corresponding to data points indicated by red arrows are plotted in figure 3.

Figure 2

Figure 3. Examples of RF-generated electron plasmas. The axially-integrated transverse distributions of some of the plasmas from figure 2 are visualized as de-noised CCD images at plasma dump. Images numbered from 1 to 6 correspond to the frequencies 1.8, 3.1, 4.3, 8.8, 9.2 and 9.8 MHz, respectively (also indicated in figure 2).

Figure 3

Figure 4. Repeatability test. The three frequency scan measurements were recorded during a single experiment/day with the same set of parameters, i.e. trapping length $L_{trap}=570~\text{mm}$, magnetic field $B=0.1~\text{T}$, excitation amplitude $V_{RF}=1.5~\text{V}$. (a) Total confined charge. The vertical dashed line indicates the threshold frequency ${\it\nu}_{thr}$ for plasma production and confinement. (b) Mean particle density.

Figure 4

Figure 5. Parametric measurement of plasma production against trapping length. (a) Total confined electron charge. The electron plasma produced by RF excitation is measured while slowly sweeping the RF frequency ${\it\nu}_{RF}$ at constant amplitude $V_{RF}=1.5~\text{V}$ and magnetic field $B=0.1~\text{T}$. The measurement is repeated for different axial trap lengths. (b) The corresponding mean electron density is plotted.

Figure 5

Figure 6. Threshold frequency versus the inverse of the trapping length. Two data sets (solid circles and hollow squares) from two distinct experiments are shown spanning trapping lengths $L_{trap}=180{-}660~\text{mm}$. All experiments were performed at constant amplitude $V_{RF}=1.5~\text{V}$ and magnetic field $B=0.1~\text{T}$. Error bars ($\pm 50~\text{kHz}$) indicate the uncertainty of the threshold value in a single frequency sweep (as estimated in § 2.2). The solid line is a linear fit to all data.

Figure 6

Figure 7. Parametric measurement of plasma production against the excitation amplitude. (a) Total confined electron charge. The electron plasma produced by RF excitation is measured while slowly sweeping the RF frequency ${\it\nu}_{RF}$ at constant trap length $L_{trap}=570~\text{mm}$ and magnetic field $B=0.1~\text{T}$. The measurement is repeated for different excitation amplitudes $V_{RF}$. (b) The corresponding mean electron density is plotted.

Figure 7

Figure 8. Threshold frequency versus the excitation amplitude. Data from three separate experiments (hollow black squares, solid blue circles, solid red triangles) are shown. All experiments were performed at constant trap length $L_{trap}=570~\text{mm}$ and magnetic field $B=0.1~\text{T}$, changing the excitation amplitude $V_{RF}$ only. Error bars ($\pm 50~\text{kHz}$) indicate the uncertainty of the threshold value in a single frequency sweep (as estimated in § 2.2).

Figure 8

Figure 9. Parametric measurement of plasma production against the magnetic field intensity. (a) Total confined electron charge. The electron plasma produced by RF excitation is measured while slowly sweeping the RF frequency ${\it\nu}_{RF}$ at constant excitation amplitude $V_{RF}=1.5~\text{V}$ and trap length $L_{trap}=570~\text{mm}$. The measurement is repeated for different magnetic fields. (b) The corresponding mean electron density is plotted.

Figure 9

Figure 10. Threshold frequency dependence on the magnetic field intensity $B$. All experiments were performed at constant excitation amplitude $V_{RF}=1.5~\text{V}$ and trap length $L_{trap}=570~\text{mm}$ and the magnetic field was varied in the range 0.06–0.16 T. The threshold frequency ${\it\nu}_{thr}$ is plotted against $B^{-2}$ together with a linear fit (solid line). Error bars ($\pm 50~\text{kHz}$) indicate the uncertainty of the threshold value in a single frequency sweep (as estimated in § 2.2).