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ALD for clean energy conversion, utilization, and storage

Published online by Cambridge University Press:  18 November 2011

Jeffrey W. Elam
Affiliation:
Argonne National Laboratory, Argonne, IL 60439, USA; jelam@anl.gov
Neil P. Dasgupta
Affiliation:
Stanford University, Stanford, CA 94305; dasgupta@stanford.edu
Fritz B. Prinz
Affiliation:
Stanford University, Stanford, CA 94305; fbp@cdr.stanford.edu

Abstract

Atomic layer deposition (ALD) uses self-limiting chemical reactions between gaseous precursors and a solid surface to deposit materials in a layer-by-layer fashion. This process results in a unique combination of attributes, including sub-nm precision, the capability to engineer surfaces and interfaces, and unparalleled conformality over high-aspect ratio and nanoporous structures. Given these capabilities, ALD could play a central role in achieving the technological advances necessary to redirect our economy from fossil-based energy to clean, renewable energy. This article will survey some of the recent work applying ALD to clean energy conversion, utilization, and storage, including research in solid oxide fuel cells, thin-film photovoltaics, lithium-ion batteries, and heterogenous catalysts. Throughout the manuscript, we will emphasize how the unique qualities of ALD can enhance device performance and enable radical new designs.

Information

Type
Research Article
Copyright
Copyright © Materials Research Society 2011
Figure 0

Figure 1. (a) Scanning electron microscopy image of a corrugated solid oxide fuel cell fabricated by nanosphere lithography with an atomic layer deposition YSZ electrolyte. Scale bar = 500 nm. (b) Current-voltage curves for H2/air fuel cells at 450°C for nanostructured and unpatterned geometries. The use of ALD to create a 3D fuel cell structure led to an increase in the active surface area, resulting in improved performance compared to that for a flat geometry. Reprinted with permission from Reference 13. ©2011, American Chemical Society.

Figure 1

Figure 2. (a) Cross-sectional scanning electron microscopy image of a TiO2 tube cleaved to reveal the indium tin oxide (ITO) tube beneath. The concentric tubes, grown by atomic layer deposition, are embedded in a ~60 μm long alumina pore. (b) Short-circuit photocurrent density for devices with (blue, closed circle) and without (red, open circle) 7 nm of ITO in the pores as a function of TiO2 tube wall thickness. Reprinted with permission from Reference 38. ©2008, American Chemical Society.

Figure 2

Figure 3. (a) Transmission electron microscopy image of a silicon nanowire (SiNW) coated with PbS quantum dots by atomic layer deposition (ALD). Scale bar = 10 nm. (b) Photoluminescence (PL) spectra for bare SiNWs (blue), 10 cycles of ALD PbS (black), and 30 cycles of ALD PbS (red). The ability to uniformly coat nanowires with a single layer of quantum dots allows for a unique way to tune the optical properties of these materials by simply controlling the number of ALD cycles. Reprinted with permission from Reference 50. ©2011, American Chemical Society.

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Figure 4. Schematic illustration of catalyst synthesis by atomic layer deposition (ALD). Starting from an inert substrate with the desired nanostructure, a chemically active support layer is applied by ALD. Next, ALD is used to deposit a uniform layer of catalytically active nanoparticles or surface species. Finally, a protective stabilization layer is deposited by ALD to prevent sintering. In this way, any substrate having a preferred nanostructure and porosity can be converted into the desired catalyst.

Figure 4

Figure 5. (a) Scanning electron microscopy image of 2 nm atomic layer deposition (ALD) Pt nanoparticles uniformly dispersed on strontium titanate nanocubes. (b) Transmission electron microscopy image of 1.3 nm ALD Pt-Ru nanoparticles supported on Al2O3 nanospheres (inset shows histogram of particle sizes). (c) High-resolution transmission electron microscopy image of sample in Figure 5b revealing lattice fringes from nanoparticles and the substrate. Figure 5a is reprinted with permission from Reference 57. ©2009, Wiley-VCH. Figure 5b and 5c are reprinted with permission from Reference 59. ©2010, American Chemical Society.