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Theoretical and numerical study of nanoporous evaporation with receded liquid surface: effect of Knudsen number

Published online by Cambridge University Press:  04 October 2021

Ran Li*
Affiliation:
MOE Key Laboratory of Enhanced Heat Transfer and Energy Conservation, Beijing Key Laboratory of Heat Transfer and Energy Conversion, Beijing University of Technology, Beijing 100124, China
Jiahao Wang
Affiliation:
MOE Key Laboratory of Enhanced Heat Transfer and Energy Conservation, Beijing Key Laboratory of Heat Transfer and Energy Conversion, Beijing University of Technology, Beijing 100124, China
Guodong Xia*
Affiliation:
MOE Key Laboratory of Enhanced Heat Transfer and Energy Conservation, Beijing Key Laboratory of Heat Transfer and Energy Conversion, Beijing University of Technology, Beijing 100124, China
*
† Email addresses for correspondence: liran@bjut.edu.cn, xgd@bjut.edu.cn
† Email addresses for correspondence: liran@bjut.edu.cn, xgd@bjut.edu.cn

Abstract

The liquid evaporation from nanoscale pores has attracted much attention from researchers due to its importance in water treatment and device cooling related applications. It is crucial to investigate the receded liquid case as the vapour flow resistance in a nanopore has high impacts on the evaporation rate. This paper proposed a semi-empirical analysis on nanoporous evaporation with a receded liquid surface under the influence of the Knudsen number. The vapour flow dynamics in a nanopore was examined considering the multiple reflections of vapour molecules. We calculated the value of pore transmissivity based on transitional gas flow correlation which incorporated the effect of the Knudsen number. Direct simulation Monte Carlo method was employed to provide validation for the present model. The vapour density jump near the liquid surface and the pressure ratio between the far field and saturation value were predicted by our model with good precision. It was shown that the vapour flow resistance in the nanopore accounted for more than 90 % of the total resistance in present cases. With increasing Knudsen number, the pressure ratio gradually drops and reaches an asymptotic level. This suggested a relatively higher evaporation resistance in free molecular regimes. The present work revealed the importance of the Knudsen number in nanoporous evaporation with receded liquids, providing insights into the governing factors under various Knudsen regimes.

Information

Type
JFM Papers
Copyright
© The Author(s), 2021. Published by Cambridge University Press
Figure 0

Figure 1. Schematic of the diffusive reflection and inter-molecular collisions for vapour flow in a nanopore.

Figure 1

Figure 2. The multiple reflections of emitted vapour molecules in nanopores. Here, fL is the VDF corresponding to the liquid surface temperature.

Figure 2

Figure 3. The multiple reflections of backflow vapour molecules in nanopores. Here, fb is the VDF of the backflow molecules while ft is a companion of fb with the same mass flux.

Figure 3

Figure 4. Illustration of the three locations occurring in the moment equations.

Figure 4

Figure 5. Computational domain for nanoporous evaporation by DSMC.

Figure 5

Table 1. Overview of parameters adopted in present DSMC simulations.

Figure 6

Table 2. Detailed parameters used in each simulation case.

Figure 7

Figure 6. DSMC simulation results of case 1: vapour density contour (a) and the density distribution along the x-axis (b).

Figure 8

Figure 7. Variation of total particle number with simulation time for case 1. The inset shows the vapour density distribution in the y direction at the far field.

Figure 9

Figure 8. The vapour density contours at different average Kn in a nanopore. For case 5 and case 9 the domain is partially displayed.

Figure 10

Figure 9. Molecular VDFs at the pore outlet and near the top pore wall under different values of Kn. Three cases are considered: case 1 (a), case 5 (b) and case 9 (c). The ratio of moments at the two locations is calculated and shown in (d) for the different cases.

Figure 11

Figure 10. Pressure ratio between the far field and saturation changing with average Kn. The DSMC simulation results are compared with the present model as well as to the correlations developed by Berman and John et al.

Figure 12

Figure 11. Validation of the present model for varied evaporation coefficient (σ) and evaporation rate (S∞) using DSMC data.