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Considerations on the de-embedding of differential devices using two-port techniques

Published online by Cambridge University Press:  07 July 2010

Vadim Issakov*
Affiliation:
Department of High-Frequency Electronics, University of Paderborn, Warburgerstr. 100, D-33098 Paderborn, Germany.
Maciej Wojnowski
Affiliation:
Infineon Technologies AG, Am Campeon 1-12, D-85579 Neubiberg, Germany. Institute for Electronics Engineering, University of Erlangen-Nuremberg, Cauerstr. 9, D-91058 Erlangen, Germany.
Andreas Thiede
Affiliation:
Department of High-Frequency Electronics, University of Paderborn, Warburgerstr. 100, D-33098 Paderborn, Germany.
Robert Weigel
Affiliation:
Institute for Electronics Engineering, University of Erlangen-Nuremberg, Cauerstr. 9, D-91058 Erlangen, Germany.
*
Corresponding author: Vadim Issakov E-mail: VIssakov@mail.uni-paderborn.de
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Abstract

Differential signaling is very common for high frequency integrated circuit design. Accurate multimode de-embedding at multigigahertz frequencies, however, is a major challenge. The differential and common-mode parameters can be obtained by converting the measured four-port nodal S-parameters into the mixed-mode form. Under certain conditions, it is possible to separate the modes and consider only the entries corresponding to the differential S-parameters. This allows to reduce the measured 4 × 4 matrix to a 2 × 2 matrix and consider the differential device as a two-port network. Thus, the standard de-embedding techniques, derived for two-port networks, can be applied to differential S-parameters. The purpose of this paper is to investigate the applicability of this approach for on-wafer measurements. We describe analytically the conditions under which this method is valid. As an example, a 2:1 transformer, manufactured in Infineon's 0.13 μm CMOS (complementary metal-oxide semiconductor) process, has been characterized. On-chip de-embedding structures have been fabricated using the same process. The results obtained using Short-Open, Thru-Line, and Thru-Line-Reflect de-embedding techniques are compared. Additionally, the results are verified by simulation of a device under test having high-mode conversion.

Information

Type
Original Article
Copyright
Copyright © Cambridge University Press and the European Microwave Association 2010
Figure 0

Fig. 1. Chain connection of four-port DUT and error networks.

Figure 1

Fig. 2. Differential Thru standard.

Figure 2

Fig. 3. Differential line standard.

Figure 3

Fig. 4. Micrographs of the de-embedding structures in CMOS.

Figure 4

Fig. 5. Chip micrograph of the 2:1 transformer (553 µm × 430 µm).

Figure 5

Fig. 6. Primary side inductance of the 2:1 transformer in CMOS.

Figure 6

Fig. 7. Secondary side inductance of the 2:1 transformer in CMOS.

Figure 7

Fig. 8. Simulated asymmetrical differential DUT.

Figure 8

Fig. 9. Simulated asymmetrical differential DUT with error boxes.

Figure 9

Fig. 10. Simulated de-embedding structures.

Figure 10

Fig. 11. Comparison of the differential transmission parameter.

Figure 11

Fig. 12. Comparison of the differential to common-mode conversion parameter.

Figure 12

Fig. 13. Comparison of the common-mode transmission parameter.