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Gas-phase synthesis of nanoparticles: present status and perspectives

Published online by Cambridge University Press:  22 August 2018

Y. Huttel*
Affiliation:
Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas (CSIC), c/Sor Juana Inés de la Cruz 3 28049 Madrid, Spain
L. Martínez
Affiliation:
Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas (CSIC), c/Sor Juana Inés de la Cruz 3 28049 Madrid, Spain
A. Mayoral
Affiliation:
School of Physical Science and Technology, ShanghaiTech University, Pudong, Shanghai 201210, China
I. Fernández
Affiliation:
Nano4Energy SLNE, Escuela Técnica Superior de Ingenieros Industriales (ETSII-UPM), Instituto de Fusión Nuclear, c/José Gutiérrez Abascal 2, 28006 Madrid, Spain
*
Address all correspondence to Y. Huttel at huttel@icmm.csic.es

Abstract

There is an increasing interest in the generation of well-defined nanoparticles (NPs) not only because of their size-related particular properties, but also because they are promising building blocks for more complex materials in nanotechnology.

Here, we will shortly introduce the gas-phase synthesis technology that has evolved rapidly in the last years and allows the fabrication of complex NPs with controllable and tuneable chemical composition and structure while keeping very good control over the size distribution. We will also address some limitations of the technology (stability over time, production yield, etc.) and discuss possible solutions.

Information

Type
Research Letters
Copyright
Copyright © Materials Research Society 2018 
Figure 0

Figure 1. Schematic representations of the operation of the MICS for the production of (a) single-element NPs, (b) alloyed NPs, and (c) core–shell-type NPs.

Figure 1

Figure 2. Comparison of ion current (that is proportional to NP fabrication rate) as a function of NP diameter, measured from a new and flat magnetron target (upper curve) and from a used (with race track) target.

Figure 2

Figure 3. Surface images of targets after (a) 5% use in standard magnetron and (b) more than 20% use in a Full Face Erosion magnetron; (c) microscope image of target used in standard magnetron; (d) 3D image of target used in a Full Face Erosion magnetron; (e) depth profiles comparison between targets used in standard magnetron and FFE magnetron. Profiles are performed on lines indicated in Figs. 3(c) and 3(d).

Figure 3

Figure 4. Atomic force microscopy (AFM) images. (a) AFM image of an Au nanoparticles deposit on Si wafer with starting base pressure of 8×10−9 mbar; (b) similar AFM image of a deposit of Au nanoparticles with starting base pressure of 2×10−6 mbar due to controlled air leak of 0.1 sccm; (c) line profiles following the lines displayed in Figs. 4(a) and 4(b). Both deposits have been performed with the following parameters: argon flow: 80 sccm; applied magnetron power: 90 W; deposition time: 140 s.

Figure 4

Figure 5. Evolution of the deposition rate and mean height of Au NPs as a function of the injected flow of water vapor.

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