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An in situ study on Kr ion–irradiated crystalline Cu/amorphous-CuNb nanolaminates

Published online by Cambridge University Press:  04 March 2019

Zhe Fan*
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, USA
Cuncai Fan*
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, USA
Jin Li
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, USA
Zhongxia Shang
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, USA
Sichuang Xue
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, USA
Marquis A. Kirk
Affiliation:
Nuclear Engineering Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
Meimei Li
Affiliation:
Nuclear Engineering Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
Haiyan Wang
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, USA; and School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, USA
Xinghang Zhang*
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, USA
*
a)Address all correspondence to these authors. e-mail: zfan.phd@gmail.com

Abstract

Nanocrystalline and nanolaminated materials show enhanced radiation tolerance compared with their coarse-grained counterparts, since grain boundaries and layer interfaces act as effective defect sinks. Although the effects of layer interface and layer thickness on radiation tolerance of crystalline nanolaminates have been systematically studied, radiation response of crystalline/amorphous nanolaminates is rarely investigated. In this study, we show that irradiation can lead to formation of nanocrystals and nanotwins in amorphous CuNb layers in Cu/amorphous-CuNb nanolaminates. Substantial element segregation is observed in amorphous CuNb layers after irradiation. In Cu layers, both stationary and migrating grain boundaries effectively interact with defects. Furthermore, there is a clear size effect on irradiation-induced crystallization and grain coarsening. In situ studies also show that crystalline/amorphous interfaces can effectively absorb defects without drastic microstructural change, and defect absorption by grain boundary and crystalline/amorphous interface is compared and discussed. Our results show that tailoring layer thickness can enhance radiation tolerance of crystalline/amorphous nanolaminates and can provide insights for constructing crystalline/amorphous nanolaminates under radiation environment.

Information

Type
Invited Paper
Copyright
Copyright © Materials Research Society 2019 
Figure 0

Figure 1: Irradiation-induced formation of nanocrystals in Cu/a-CuNb 100-nm nanolaminates. (a, b) BF and DF cross-section TEM images of as-deposited specimens (0 dpa). (c, d) BF and DF cross-section TEM images after irradiation to 2 dpa. Nanocrystals formed in a-CuNb layers after irradiation are marked by arrows. The red dashed lines indicate the reference position.

Figure 1

Figure 2: Nanocrystals and nanotwins observed in high-resolution TEM (HRTEM) images of Cu/a-CuNb 100-nm nanolaminates after irradiation to 2 dpa. (a) Nanocrystals of spherical shape marked by the dashed circles in HRTEM image. (b) An irregular shape Nb nanocrystal marked by a dashed box whose FFT is shown in the inset. (c) A twinned Cu nanocrystal formed in irradiated a-CuNb. The inset FFT confirms the twinned structure. (d) HRTEM of dashed box in c shows the irradiation-induced nanotwin.

Figure 2

Figure 3: Composition profile of Cu/a-CuNb nanolaminates and single-layer a-CuNb before and after irradiation. (a) Line scan profile of Cu/a-CuNb nanolaminates with varying h before irradiation. (b) EDS map of Cu/a-CuNb nanolaminates with varying h before irradiation. (c) HAADF image of single-layer a-CuNb after irradiation. (d) EDS map of (c) shows the formation of Cu-enriched particles inside the amorphous matrix after irradiation to 5 dpa.

Figure 3

Figure 4: GB migration shown by in situ TEM snapshots during irradiation of Cu/a-CuNb 100-nm nanolaminates. (a, b) BF and DF TEM micrographs showing grain C between grain A and B. (c–e) GB migration during irradiation (0.69–1.5 dpa). (f) Removal of grain C as a result of GB migration. Detailed information can be found in the Supplementary material video 1.

Figure 4

Figure 5: Defect absorption by GB and crystalline/amorphous layer interface shown by the in situ TEM snapshots during irradiation of Cu/a-CuNb 100-nm nanolaminates. (a–f) Defect cluster 1 was gradually absorbed by layer interface (yellow dashed line); defects 2 and 3 were absorbed by grain boundaries (red dashed lines), while defect 4 remained after irradiation. Detailed information can be found in Supplementary material video 2.

Figure 5

Figure 6: Comparison of microstructure of Cu/a-CuNb 10 and 50-nm nanolaminates before and after irradiation. (a–d) BF and DF TEM images showing grain coarsening in irradiated Cu/a-CuNb 10-nm nanolaminates. (e–h) Grain growth was also observed in irradiated Cu/a-CuNb 50-nm nanolaminates.

Figure 6

Figure 7: Cu grain size distribution before and after irradiation to 5 dpa for (a) Cu/a-CuNb 10-nm and (b) Cu/a-CuNb 50-nm nanolaminates. The average grain size of Cu increases from ∼14 to 23 nm (∼67% increase) for the irradiated Cu/a-CuNb 10-nm nanolaminates and increases from ∼43 to 58 nm (∼34% increase) for the Cu/a-CuNb 50-nm nanolaminates.

Figure 7

Figure 8: Defect morphology after irradiation of (a) Cu/a-CuNb 10-nm and (b) Cu/a-CuNb 50-nm nanolaminates in TEM images. After irradiation, the grain interior of Cu/a-CuNb 10 nm contained few defect clusters, whereas for the irradiated Cu/a-CuNb 50 nm, abundant defect clusters and stacking faults existed in Cu layers.

Figure 8

Figure 9: A schematic illustrating the grain size and layer thickness effect on grain coarsening, defect absorption, and nanocrystal formation.

Fan et al. supplementary material

Fan et al. supplementary material 1

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Fan et al. supplementary material

Fan et al. supplementary material 2

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