Hostname: page-component-74656f9884-j7cmm Total loading time: 0 Render date: 2026-11-07T18:25:26.943Z Has data issue: false hasContentIssue false

Effects of focused-ion-beam irradiation and prestraining on the mechanical properties of FCC Au microparticles on a sapphire substrate

Published online by Cambridge University Press:  26 July 2011

Seok-Woo Lee*
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305-4034
Dan Mordehai
Affiliation:
Department of Materials Engineering, Technion-Israel Institute of Technology, 32000 Haifa, Israel
Eugen Rabkin
Affiliation:
Department of Materials Engineering, Technion-Israel Institute of Technology, 32000 Haifa, Israel
William D. Nix
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305-4034
*
a)Address all correspondence to this author. e-mail address: swlee49@stanford.edu

Abstract

We have studied the effects of focused-ion-beam (FIB) irradiation and prestraining on the mechanical properties of nearly defect-free Au microparticles on a sapphire substrate. The Au microparticles, which were produced by a solid-state diffusion dewetting technique, were FIB-irradiated and/or prestrained, the latter using a nanoindenter with a flat ended punch operating under a nanohammering mode. Also, the prestrained Au microparticles were exposed to FIB to examine the effects of ion-beam damage on the properties of crystals containing mobile dislocations. We found that both FIB irradiation and prestraining reduced the yield strength of pristine Au microparticles significantly and made the stress–strain curves jerky. However, FIB irradiation does not affect the mechanical properties of prestrained Au microparticles very significantly. Once a microparticle contains mobile dislocations, its mechanical properties are not influenced much by the defects generated by FIB irradiation, even at the submicrometer scale.

Information

Type
Invited feature paper
Copyright
Copyright © Materials Research Society 2011
Figure 0

FIG. 1. Secondary electron microscope (SEM) images of Au microparticles synthesized by a solid-state-diffusion dewetting technique; (a) top view and (b) 52° tilted view. The insets show the individual Au microparticle with the ∼600 nm top diameter. The small triangle in the inset of (a) indicates the threefold rotational symmetry of <111> axis.

Figure 1

FIG. 2. Mechanical isolation process using a tungsten Omniprobe micromanipulator. The white triangle indicates the size of the flat-punch tip used in this study.

Figure 2

FIG. 3. SEM images of the Au microparticle exposed to the Ga+ ion beam through the 5-μm diameter circular pattern. The insets show the Au microparticle before and after the ion-beam exposure, and there is no significant change in shape.

Figure 3

FIG. 4. (a) The pristine, (b) prestrained, and (c) prestrained/FIB-irradiated Au microparticle. The Au microparticle in these SEM images is the identical one.

Figure 4

FIG. 5. (a) Stress–strain curves of the pristine, FIB-irradiated, prestrained, and prestrained/FIB-irradiated Au microparticles. The SEM images show the deformed shapes of microparticles for the four cases in the stress–strain curves; (b) pristine, (c) FIB-irradiated, (d) prestrained, and (e) prestrained/FIB-irradiated Au microparticles after the mechanical tests.

Figure 5

FIG. 6. The shear yield strength as the function of sample top diameter for the pristine, FIB-irradiated, prestrained, and prestrained/FIB-irradiated Au microparticles.

Figure 6

FIG. 7. The flow shear stress at 5% strain as the function of sample top diameter for the FIB-milled Au microparticle and the FIB-milled Au nanopillars.

Figure 7

FIG. A1. Results of Stopping and Range of Ions in Matter (SRIM) calculations for 30 keV Ga ion implantation into pure Au at (a) glancing incidence (35.3°) for the {100} top plane, (b) normal incidence (90°) for the {111} top plane, and (c) glancing incidence (4°) for the side surface of nanopillar. The total 10,000 ions collided with the gold surface in these simulations.

Figure 8

FIG. A2. The schematic of the Au microparticle and the Au nanopillar with a top diameter of 400 nm for the calculation of the total ion doses. The dimensions of ion-beam patterns are shown above samples. The shaded areas are the surfaces which are exposed to Ga+ ion beam.