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Effects of current densities on creep behaviors of Sn–3.0Ag–0.5Cu solder joint

Published online by Cambridge University Press:  11 November 2014

Limin Ma*
Affiliation:
College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China
Yong Zuo
Affiliation:
College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China
Fu Guo*
Affiliation:
College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China
Yutian Shu
Affiliation:
College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China
*
a) Address all correspondence to this author. e-mail: guofu@bjut.edu.cn

Abstract

Creep and electromigration (EM) have been two reliability concerns in microelectronic devices for a long time. The related failure mechanisms have been widely investigated and comprehended individually. However, there is a lack of attention with regard to the interaction(s) between current density and creep, the coupling effect of which is more analogous to the real service conditions of lead-free solder joint. In this study, a series of experiments were carried out on the simple shear lap joint to investigate the effects of current density magnitude on the creep behavior of solder joints. The results indicated that dislocation creep was the main failure mechanism for low current density sample. For high current density sample, the failure mechanism was mainly dominated by copper atom migrating process which led the joint experience a higher risk of brittle fracture failure.

Information

Type
Articles
Copyright
Copyright © Materials Research Society 2014 
Figure 0

FIG. 1. Schematic of joint structure.

Figure 1

FIG. 2. Schematic of experimental setup.

Figure 2

FIG. 3. Current density distribution under 2 × 103 A/cm2 condition: (a) across the solder joint, (b) in the solder matrix.

Figure 3

FIG. 4. The real time monitor of sample's physical parameters: (a) temperature variations, electrical resistance change under coupling stressing with (b) low, or (c) high current density.

Figure 4

FIG. 5. Comparison of microstructures before and after coupling stressing of creep and current density: (a), (b) 5 × 102 A/cm2 and 5.5 MPa; (c), (d) 2 × 103 A/cm2 and 5.5 MPa.

Figure 5

FIG. 6. SEM images of as-reflowed solder joint: (a) the overall view, (b) cathode and (c) anode are enlarged from A and B in (a).

Figure 6

FIG. 7. SEM images of solder joint after coupling stressing of 5 × 102 A/cm2 and 5.5 MPa for 123 h: (a) the overall view, (b) cathode and (c) anode side are enlarged from A and B in (a).

Figure 7

FIG. 8. SEM images of solder joint after coupling stressing of 5 × 102 A/cm2 and 5.5 MPa for 230 h: (a) the overall view, (b) cathode and (c) anode are enlarged from A and B in (a).

Figure 8

FIG. 9. SEM images of as-reflowed solder joint: (a) the overall view, (b) cathode and (c) anode are enlarged from A and B in (a).

Figure 9

FIG. 10. SEM images of solder joint after coupling stressing of 2 × 103 A/cm2 and 5.5 MPa for 123 h: (a) the overall view, (b) cathode and (c) anode are enlarged from A and B in (a).

Figure 10

FIG. 11. SEM images of solder joint after coupling stressing of 2 × 103 A/cm2 and 5.5 MPa for 148 h: (a) the overall view, (b) cathode and (c) anode are enlarged from A and B in (a).

Figure 11

FIG. 12. The fracture morphology of joint after coupling stressing: (a), (b) and (c) 5 × 102 A/cm2 and 5.5 MPa; (d), (e), and (f) 2 × 103 A/cm2 and 5.5 MPa.

Figure 12

FIG. 13. Orientation map of solder joint before and after coupling stressing of 2 × 103 A/cm2 and 5.5 MPa: (a) Sn-rich phase for 0 h; (b) Sn-rich phase for 50 h; (c) Cu6Sn5 for 0 h; (d) Cu6Sn5 for 50 h.

Figure 13

FIG. 14. Schematics of solder joint failure mechanism with or without EM: (a) origin structure; (b), (c) without EM; (d), (e) with EM (not in scale).