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P-type doping of Hf0.6Zr0.4NiSn half-Heusler thermoelectric materials prepared by levitation melting and spark plasma sintering

Published online by Cambridge University Press:  11 May 2011

Kai Xiao
Affiliation:
State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
Tie-Jun Zhu*
Affiliation:
State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
Cui Yu
Affiliation:
State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
Sheng-Hui Yang
Affiliation:
State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
Xin-Bing Zhao
Affiliation:
State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
*
a)Address all correspondence to this author. e-mail: zhutj@zju.edu.cn

Abstract

The Y-doped (Hf0.6Zr0.4)1-xYxNiSn (x = 0, 0.01, 0.02, 0.04, 0.06, 0.1, and 0.2) half-Heusler alloys have been prepared by levitation melting and spark plasma sintering. The effect of Y doping on thermoelectric properties of the alloys was investigated in the temperature range of 300–900 K. Y-doped samples had the lower electrical conductivity compared with the parent compound without Y doping. The thermal conductivity had weak dependence on Y doping content. The absolute values of Seebeck coefficient decreased significantly when x < 0.04. The sign of Seebeck coefficient turned from negative to positive at room temperature for x = 0.04 and 0.1, which means that the hole carriers became dominant in these alloys. However, the alloys changed to n-type conduction again at high temperatures. The maximum figure of merit value of about 0.45 was obtained at 780 K for the undoped sample.

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Articles
Copyright
Copyright © Materials Research Society 2011
Figure 0

FIG. 1.X-ray diffraction patterns of the (Hf0.6Zr0.4)1-xYxNiSn (x = 0, 0.01, 0.02, 0.04, 0.06, 0.1, and 0.2) samples after (a) ball milling and (b) SPS. Almost all the diffraction peaks can be indexed to a half-Heusler structure except small amounts of impurity phases. The calculated lattice constants are showed in the inset of (a) as a function of nominal Y-doping ratio.

Figure 1

FIG. 2.(a) Secondary electron image of levitation melted sample and (b) backscattering electron image of spark plasma sintered sample with x = 0.1.

Figure 2

FIG. 3.Temperature dependence of (a) electrical conductivity, (b) and Seebeck coefficient, and (c) power factor of (Hf0.6Zr0.4)1-xYxNiSn (x = 0, 0.01, 0.02, 0.04, 0.06, 0.1, and 0.2) compounds.

Figure 3

TABLE I.Room-temperature electrical properties of some samples.

Figure 4

FIG. 4.Temperature dependences of (a) the thermal conductivity and (b) the electrical thermal conductivity and lattice thermal conductivity of (Hf0.6Zr0.4)1-xYxNiSn (x = 0, 0.01, 0.02, 0.04, 0.06, 0.1, and 0.2) compounds.

Figure 5

FIG. 5.Temperature dependence of figure of merit value of (Hf0.6Zr0.4)1-xYxNiSn (x = 0, 0.01, 0.02, 0.04, 0.06, 0.1, and 0.2) compounds.