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Multiferroic magnetoelectric nanostructures for novel device applications

Published online by Cambridge University Press:  04 September 2015

Jia-Mian Hu
Affiliation:
The Pennsylvania State University, USA; juh34@psu.edu
Tianxiang Nan
Affiliation:
Northeastern University, USA; nan.t@husky.neu.edu
Nian X. Sun
Affiliation:
Northeastern University, USA; n.sun@neu.edu
Long-Qing Chen
Affiliation:
The Pennsylvania State University, USA; lqc3@psu.edu

Abstract

Multiferroic magnetoelectric nanostructures with coupled magnetization and electric polarization across their interfaces have stimulated intense research activities over the past decade. Such interface-based magnetoelectric coupling can be exploited to significantly improve the performance of many devices such as memories, tunable radio-frequency/microwave devices, and magnetic sensors. In this article, we introduce a number of current or developing technologies and discuss their limitations. We describe how the use of magnetoelectric nanostructures can overcome these limitations to optimize device performance. We also present challenges that need to be addressed in pursuing practical applications of magnetoelectric devices.

Information

Type
Research Article
Copyright
Copyright © Materials Research Society 2015 
Figure 0

Figure 1. Interplay among lattice, spin, orbit, and charge degrees of freedom across a magnetic–ferroelectric interface induces coupled magnetization and electric polarization. (a) Lattice deformation (strain) can act over a long spatial scale. (b) Polarization charges in the ferroelectric region can attract or repel spin-polarized electrons in the interface region of the magnet, as schematically shown in (c) by the density of spin-polarized electrons, n(e–), in the case where electrons are attracted to the interface. Accordingly, interfacial magnetism can be modulated based on electrically induced changes in interfacial spin polarization and interfacial orbital configuration.

Figure 1

Figure 2. Schematics of (a) electrically assisted magnetic recording, where an electric field (E) is generated across the storage unit by applying a voltage (V) through the write head and an electrode layer underneath the ferroelectric layer. (b) Possible electrically driven magnetic recording under zero magnetic field in high-density arrays of magnetic–ferroelectric nanoislands, namely, bit-patterned magnetoelectric media, where the electric field is selectively applied across the isolated storage unit through the write head and the patterned bottom electrode. Perpendicularly magnetized recording media are considered in all cases, with the arrows indicating magnetization orientations. For simplicity, only the principle of the writing process is shown. (a) Prepared on the basis of Reference 21. Magnetic and ferroelectric thin films in (a) (1a and 2a, respectively) and nanoislands (1b and 2b, respectively) in 2b; (3a) thin-film and (3b) patterned electrode underlayer in 2a and 2b, respectively; (4) substrate; (5) write coil; and (6) Yoke/return pole. Note: I, current.

Figure 2

Figure 3. Schematics of (a) a trilayered magnetoresistive element consisting of two magnetic layers (yellow) separated by a nonmagnetic metallic spacer or dielectric tunnel barrier (blue) in magnetic random-access memory (MRAM), where the reversal of magnetization (Mfree) in the free layer (top) can be driven by a spin-polarized current (I), leading to parallel or antiparallel magnetic alignment between Mfree and magnetization with a fixed direction (Mfixed) in the bottom magnetic layer. (b) A trilayered magnetoresistive element on top of a ferroelectric layer with a bottom electrode for magnetoelectric RAM applications. An electric field (E) applied across the ferroelectric layer can switch the magnetization in its adjacent free layer (Mfree) by 90° and even 180° according to recent reports (see text). (c) Electrically driven nonvolatile electric resistance switching in a magnetoresistive element consisting of a nickel-free layer and a 2-μm-thick (011) Pb(Mg1/3Nb2/3)0.7Ti0.3O3 ferroelectric layer (ΔR, change in electrical resistance). (d) In-plane magnetization vector distributions in the nickel corresponding to the high- (left) and low- (right) resistance states under zero voltages. mz indicates the out-of-plane component of the normalized magnetization. (c) Adapted from Reference 45. (d) Reproduced with permission from Reference 45. © 2011 Nature Publishing Group.

Figure 3

Figure 4. Experimental setup of ferromagnetic resonance measurement for demonstrating the working principles of (a) magnetically and (b) electrically tunable radio-frequency/microwave magnetic devices, where a single-layer magnetic thin film (e.g., Co20Fe60B20 [CoFeB]) or a bilayered magnetoelectric nanostructure is laid face down on an S-shaped coplanar waveguide (CPW). The CPW generates a microwave magnetic field to excite magnetization precession in CoFeB. A DC testing magnetic field (HDC) of 720 Oe is applied along the [100] direction in both cases (not shown). (c) First derivative of the absorption power (P) with respect to HDC as a function of the frequency of the microwave magnetic field. The resonance frequencies that are determined by the intersection of the spectra and the baseline (dashed line) can be modulated by an applied electric field. The ferroelectric layer is Pb(Mg1/3Nb2/3)0.71Ti0.3O0.29 (PMN-PT). (b) Adapted with permission from Reference 65. © 2014 Royal Society Publishing. (c) Adapted with permission from Reference 66. © 2013 Wiley-VCH.

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Figure 5. (a) Cross-sectional transmission electron microscope bright-field image of a horizontal magnetoelectric nanostructure consisting of a Ta/Cu/Mn70Ir30/Fe50Co50 multilayer deposited on an AlN layer on a silicon cantilever substrate, with selected-area electron diffraction patterns of different sample areas. The asterisk inside the blue circle on the right indicates the area next to the multilayer/AlN interface. (b) The magnetoelectric voltage coefficient αH,31 as a function of the DC bias magnetic field (μ0HDC, where the prefactor μ0 is the vacuum permeability) in the magnetoelectric nanostructure based on a Ta/Cu/Mn70Ir30/Fe70.2Co7.8Si12B10 multilayer under an excitation magnetic field (δH) with a frequency of 1197 Hz. The inset schematically shows the sample geometry and the definition of αH,31, where δV is the induced voltage and t is the thickness of the AlN layer. Adapted with permission from Reference 83. © 2012 Nature Publishing Group.